film preparation meaning in Chinese
薄膜制备
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Examples
- Since appeared in 1987 , pulsed laser deposition ( pld ) made rapid progress and has been one of the best technology of thin films preparation . , pld has received much attention and has been applied
脉冲激光沉积（ pld ）法自1987年出现以来，随着激光技术的进步而迅速发展，现已成为最好的薄膜制备技术之一。 - With the development of thin film science and technology , various thin film preparation techniques developed rapidly , as a result , conventional so - called filming has developed from single vacuum evaporation to many new film preparation techniques , such as ion plating , sputtering , laser deposition , cvd , pecvd , mocvd , mbe , liquid growth , microwave and mtwecr , etc . , of which vacuum evaporation is the common technology for thin film preparation , because it has the distinct advantage of high quality of film deposition , good control - ability of deposition rate and high versatility
随着薄膜科学与技术的发展，各种薄膜制备方法得到了迅速发展，传统的所谓镀膜，已从单一的真空蒸发发展到包括蒸镀、离子镀、溅射镀膜、化学气相沉积( cvd ) 、 pecvd 、 mocvd 、分子束外延( mbe ) 、液相生长、微波法及微波电子共旋( mwecr )等在内的成膜技术。其中电子束蒸发技术是一种常用的薄膜制备技术，它具有成膜质量高，速率可控性好，通用性强等优点。 - Sige - on - insulator ( sigeoi ) , which appears very recently , integrates both the advantages of soi and that of sige and thus attracts much attention for the potential applications in low voltage , low power consumption , high dense integrated circuits and optoelectronics , system on chip etc . but people are in the very beginning of the sige - oi material fabrication research . this work focuses on these three facets : 1 . sige film preparation ; 2
本论文结合以上背景，主要进行了以下几个方面的研究：一、硅基上sige材料的异质外延生长技术，以及sige薄膜的表征；二、 sige - oi的simox制备工艺研究；三、 sige - oi材料的smart - cut制备工艺研究，以及sige / si异质结结构中注入h离子的物理效应。 - Laser - ablation technique is a powerful and available method , and has been widely used in many important fields , such as thin film preparation , nano - technique and element analysis . in the course of laser - ablation , the ejected species is normally called laser ablation plasma , and its processes of production and expansion are very complex
脉冲激光烧蚀技术在材料处理、薄膜制备、纳米技术、微量元素分析等领域的应用越来越广泛，但激光-固体相互作用、等离子体的形成及膨胀等过程尚未完全清楚。 - In this thesis we have expatiated on the methods of the c60 thin films preparation , and the process with vacuum evaporation . the effect , which was caused by different gas pressures and other element doped , on surface morphology , structure and optical properties of c60 films have been studied by using scanning electron microscopy ( sem ) , ultraviolet visible optical absorption spectroscopy ( uv / vis ) ( type : uv - 240 ) , ellipsometer and x - ray diffraction
本论文阐述了用真空蒸镀法制备c60薄膜的方法和过程，研究了在不同气氛下生长和掺杂对c60薄膜的表面形貌、结构和光吸收特性的影响；用xl30fge型扫描电镜对c60薄膜表面形貌进行观察；用uv - 240型紫外可见光双光束分光光度计进行紫外、可见光吸收测量；用椭偏仪对薄膜进行厚度和折射率测量；用x射线衍射对薄膜结构进行分析。